FZ Silicon Wafer Semiconductor

FZ Silicon Wafer Semiconductor

Description FZ silicon wafer is a type of high-purity silicon wafer that is commonly used in the semiconductor industry. FZ stands for Float Zone, which is a method of growing single crystal silicon. During the FZ process, a silicon rod is suspended vertically in a high-temperature furnace, and...

説明

 

Description

FZ silicon wafer is a type of high-purity silicon wafer that is commonly used in the semiconductor industry. FZ stands for Float Zone, which is a method of growing single crystal silicon.

During the FZ process, a silicon rod is suspended vertically in a high-temperature furnace, and a molten zone is created by heating a small section of the rod. The molten zone is moved along the length of the rod, and as it cools, it solidifies into a single crystal. The process is repeated multiple times until the entire length of the rod has been converted into a single crystal.

FZ silicon wafers have a very high level of purity, with impurity levels typically less than one part per billion. This purity makes them ideal for use in high-performance electronic devices, such as microprocessors, memory chips, and solar cells. FZ wafers are also used in scientific research and in the production of high-performance sensors and detectors.

Specification

Diameter 2"  3"  4"  5"  6"  8" 
Growth Method FZ
Orientation  < 1-0-0 > , < 1-1-1 > 
Type/Dopant Intrinsic, N Type/Phos, P Type/Boron
Thickness (um) 279 380 525 625 675 725
Thickness Tolerance Standard ± 25um ±50um
Resistivity(Ohm-cm) 1000-20000, Maximum Capabilities>20000, and 1-5
Surface Finished P/E , P/P, E/E, G/G
TTV (um) Standard < 10 um
Bow/Warp  (um) Standard <40 um

FZ Silicon Wafer Semiconductor

 

 

 

 

 

 

人気ラベル: fz silicon wafer semiconductor

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